Flat-type infrared heating furnace IR-FP Series
Infrared concentrated heating enables high-speed, high-temperature, and uniform heating. We will manufacture according to the customer's needs.
The "IR-FP Series" is a flat-type infrared heating furnace capable of heating up to 1100°C. It allows for output adjustment for each zone, enabling heating in various temperature environments. Clean heating is possible, along with vacuum compatibility, gas flow, and observation. It is ideal for heating silicon wafers, compound semiconductors, and thin steel plate processing. It can be used for applications involving heat resistance, deformation, and observation of resins, films, and adhesives. The furnace size can be adjusted according to the sample size. For more details, please contact us or refer to the catalog.
- Company：米倉製作所
- Price：Other
